Etch process monitors for buried heterostructures
US4652333A · kind A · utility
25Cited by
7References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 19, 1985 |
| Grant date | Mar 24, 1987 |
| Priority date | — |
| Expiry date | Jun 19, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/2275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention describes the use of etch process monitors or indicators to improve the reproducibility of etching hourglass shaped mesas for buried heterostructure laser/amplifier structures or integrated optical components in III-V compounds (e.g. GaAs/AlGaAs or InP/InGaAsP).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.