Patent · US Expired

Sputtering cathode

US4652358A · kind A · utility

9Cited by

6References

2Claims

0Family size

Assignee

Leybold-Heraeus GmbH · DE

Inventors

Gerd Deppisch · Aschaffenburg, DE
Klaus Roll · Hanau, DE
Karl-Heinz Schuller · Obertshausen, DE

Key dates

Filing date	Aug 24, 1984
Grant date	Mar 24, 1987
Priority date	—
Expiry date	Aug 24, 2004

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3408
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a cathode system for sputtering apparatus which includes a target plate of ferromagnetic material. A magnet system is situated behind the target plate and has opposed poles positioned so that at least a portion of the lines of force emerging from the poles passes out through the target and returns thereto. The target is placed on a floor which includes strips of ferromagnetic material in the area of the poles of the magnet system. These strips close the magnetic circuit between the magnet system and the target plate. The remainder of the floor is made of nonmagnetic material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.