Semiconductor structure having alpha particle resistant film and method of making the same
US4653175A · kind A · utility
7Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1986 |
| Grant date | Mar 31, 1987 |
| Priority date | — |
| Expiry date | Mar 4, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/953
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An applique of a prepatterned film of alpha particle resistant material, such as polyimide, is applied to a semiconductor wafer. The prepatterned film covers only the critical areas e.g. those affected by alpha particle impingement. Bond pads and scribe streets are not covered by the applique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.