Patterned film of thiocarbonyl fluoride polymer
US4656108A · kind A · utility
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4Claims
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Key dates
| Filing date | Jun 20, 1985 |
| Grant date | Apr 7, 1987 |
| Priority date | — |
| Expiry date | Jun 20, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24306
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.