Anodized aluminum substrate for plasma etch reactor
US4657617A · kind A · utility
13Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1984 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Oct 22, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/137
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate to use as electrode in a plasma etch reactor is fabricated from aluminum with an annulus that is anodized to protect it from being exposed to the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.