Powered load lock electrode/substrate assembly including robot arm, optimized for plasma process uniformity and rate
US4657618A · kind A · utility
9Cited by
6References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1984 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Oct 22, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67766
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrode and substrate assembly for a plasma reactor allows high power plasma processing with low frequency excitation. The electrode sub-assembly is contained in a chamber which is used for pre-treatment such as de-scumming photoresist or for post-etch resist stripping and passivation. A post-etch treatment is essential in plasma aluminum etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.