Automated single slice powered load lock plasma reactor
US4657620A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1984 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Oct 22, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor for the manufacturing of semiconductor devices has powered loadlocks and a main process chamber where slices can be processed one slice at a time with pre-etch plasma treatments before the main etching processing and afterwards receive a post etch treatment. The system comprises powered loadlocks, a main chamber, vacuum pumps radio frequency power supplier, radio frequency matching networks, heat exchangers and throttle valve and pressure controllers, gas flow distribution and microprocessor controllers. The semiconductor wafers are automatically fed one at a time from storage cassettes through isolation gates with articulated mechanical arms to a powered entry loadlock for pre-etching processes. At the completion of the pre-etching processing, the semiconductor wafer is transferred to the main chamber automatically for the main etch process and then to the powered exit loadlock for post etch treatment and finally to an output cassette.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.