Low particulate vacuum chamber input/output valve
US4657621A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1984 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | Oct 22, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A low particulate vacuum chamber semiconductor wafer input/output valve minimizes the particulate generation by taking advantage of a camming motion at the instant of closing to insure that the valve closes normal to the reaction chamber wall. This eliminates any friction between a glandular seal in the vacuum chamber wall. As the valve closes, it strikes a stop which causes a 90 degree change in direction of the valve forcing it into tape cut. This change of direction is accomplished through a combination of an upper motion of a backing plate, and a spring-loaded linkage in stock. As the gate closes there is some particulte generated at the interface of the valve plate and the stop. This is handled by placing the area of contact outside the transportation path for the semiconductor wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.