Photosensitive polymers as coating materials
US4657832A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | May 10, 1984 |
| Grant date | Apr 14, 1987 |
| Priority date | — |
| Expiry date | May 10, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/908
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Coated material of a support, onto which is applied a radiation-sensitive coating of a homopolymer or copolymer with at least 5 mol %, based on the polymer, of structural units of the formula I ##STR1## in which R is a divalent aliphatic radical which can be interrupted by hetero-atoms or aromatic, heterocyclic or cycloaliphatic groups, a cycloaliphatic, heterocyclic or araliphatic radical, an aromatic radical in which two aryl nuclei are linked via an aliphatic group, or an aromatic radical which is substituted by at least one alkyl, cycloalkyl, alkoxy, alkoxyalkyl, alkylthio, alkylthioalkyl, hydroxyalkyl, hydroxyalkoxy, hydroxyalkylthio or aralkyl group or in which two adjacent C atoms of the aromatic radical are substituted by an alkylene group, R' independently has the same meaning as R and q is 0 or 1, and in which an aromatic radical R is not substituted by alkylene or by the abovementioned radicals if q is 0. The coating can be crosslinked directly by the effect of radiation. The material is suitable, for example, for the production of protective films and relief images.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.