Method and apparatus for production and use of nanometer scale light beams
US4659429A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1985 |
| Grant date | Apr 21, 1987 |
| Priority date | — |
| Expiry date | Aug 12, 2005 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y10/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical system for determining and reproducing spatial separation of features in the range of 80 .ANG. to 2500 .ANG. for optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of between about 80 .ANG. and 2500 .ANG. diameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.