Patent · US Expired

Method of integrating infrared sensitive image recording element with CCD on same substrate

US4661168A · kind A · utility

4Cited by
16References
20Claims
0Family size

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Key dates

Filing dateNov 25, 1985
Grant dateApr 28, 1987
Priority date
Expiry dateNov 25, 2005

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/967
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of producing a semiconductor device including an image recording unit composed of a plurality of separated detector mosaic regions of infrared sensitive monocrystalline compound semiconductor material disposed on an insulating layer on a surface of a semiconductor body containing an integrated circuit which functions as a readout device for the image recording body, wherein: the plurality of mosaic regions are formed by initially depositing a layer of the compound semiconductor material in polycrystalline form directly onto the surface of the insulating layer, and subsequently recrystallizing the polycrystalline material into monocrystalline form by irradiation of the polycrystalline material with a focused high energy light beam to melt the semiconductor material, followed by resolidification.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.