Method of producing amorphous carbon coatings on substrates and substrates coated by this method
US4661409A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 1985 |
| Grant date | Apr 28, 1987 |
| Priority date | — |
| Expiry date | Nov 13, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31696
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for producing amorphous carbon coatings on substrates by degrading a gaseous hydrocarbon compound in an ionized gas atmosphere within a reaction chamber. An electromagnetic alternating field is used for the excitation of the plasma. To achieve the object of increasing the deposition rate and permitting substrates even of great surface area to be uniformly coated, the frequency of the electromagnetic alternating field is selected in the microwave region (915 to 2,540 MHz). Furthermore, the microwave energy is put into the gaseous atmosphere by means of at least one ladder-type waveguide situated outside of the reaction chamber. The invention also relates to a substance provided with an amorphous carbon coating, in which an adhesion-mediating coating consisting of a polymer from the group of the siloxanes or silazanes is provided between the substrate and the amorphous carbon coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.