Photolithographic method and combination including barrier layer
US4663275A · kind A · utility
115Cited by
3References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 1984 |
| Grant date | May 5, 1987 |
| Priority date | — |
| Expiry date | Sep 4, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photolithographic methods employing a photoresist layer and a contrast enhancing photobleachable layer deposited thereon have certain disadvantages including compatibility and the tendency toward scum formation during stripping of the photobleachable layer. These problems are alleviated by the deposition of an aqueous alkali-soluble polymeric barrier layer such as poly(vinyl alcohol), which is removed simultaneously with the alkaline development step for the photoresist. In a preferred embodiment, the polymeric binder for the photobleachable layer is also water-soluble and is also removed simultaneously with development.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.