Phospho-boro-silanol interlayer dielectric films and preparation
US4663414A · kind A · utility
21Cited by
3References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 1985 |
| Grant date | May 5, 1987 |
| Priority date | — |
| Expiry date | May 14, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31663
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There are disclosed certain categories of novel spin-coating compositions comprising phosphorus-doped and/or boron-doped silsesquioxane oligomers. Cured interlayer dielectric films prepared therefrom have a superior combination of defined properties, particularly including adhesion (of single-coat and multiple coats) and/or resistance against degradation at temperatures above 500.degree. C. The spin-coating compositions are prepared in a critical manner from critical raw materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.