Patent · US Expired

Method of making asymmetrical layered structures from polyalkylene sulfone resins

US4666644A · kind A · utility

11Cited by
9References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateSep 23, 1985
Grant dateMay 19, 1987
Priority date
Expiry dateSep 23, 2005

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08J2381/06
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

Asymmetrical layered structures such as asymmetrical films are disclosed. The main body section contains a multitude of pores (voids). A thin surface skin is free of pores. The entire structure is fabricated from a polyalkylene sulfone resin in which the alkylene moiety contains 6 to 18 carbon atoms. Processes for preparing the structures also are disclosed. The structures are semi-permeable to gases and are used as membranes to enrich the oxygen content of oxygen/nitrogen mixtures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.