Method for patterning transparent layers on a transparent substrate
US4670097A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Dec 23, 1985 |
| Grant date | Jun 2, 1987 |
| Priority date | — |
| Expiry date | Dec 23, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/064
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
An optically transparent and electrically conductive film is patterned on a ubstrate, for instance in an electro-optical display device such as an electroluminescent device having a patterned transparent electrode layer, by a process utilizing a double masking structure that provides for more positive delineation of thin film device patterns. In this process, an indium tin oxide layer is formed between a metallic pattern on a glass substrate and a photoresist mask. The indium tin oxide layer has a metal lift-off mask under those areas that are to be removed and a photoresist protective mask over those areas that are to remain. The double masking will also provide greater protection to the electrode areas during the critical etching steps in developing an electroluminescent display.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.