Antireflective film for photoelectric devices and manufacturing method thereof
US4673476A · kind A · utility
3Cited by
7References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 21, 1986 |
| Grant date | Jun 16, 1987 |
| Priority date | — |
| Expiry date | Oct 21, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24992
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective film (7, 8) for photoelectric devices comprises at least a layer having a refractive index being the largest on the side abutting on the light receiving surface (2a) or the light emitting surface of a photoelectric device and continuously decreasing according to the distance outward from said side.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.