Fluidized bed heater for semiconductor processing
US4673799A · kind A · utility
10Cited by
7References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 1, 1985 |
| Grant date | Jun 16, 1987 |
| Priority date | — |
| Expiry date | Mar 1, 2005 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2208/00415
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A fluidized bed heater for uniformly raising the surface temperature of semiconductor wafers. The heater includes a mantle having at least one planar surface for supporting wafers, a bed of particles adjacent the mantle which is fluidized by passing a gas through the particle bed, and a bed heater which heats the bed particles to a uniform temperature so that wafers supported on the planar surface are heated to a uniform temperature. A reactor is also described which contains a reactor chamber for processing semiconductor wafers and a fluidized bed heater for uniformly heating semiconductor wafers in the reactor chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.