Method for forming a surface film of cured organosilicon polymer on a substrate surface
US4678688A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 1986 |
| Grant date | Jul 7, 1987 |
| Priority date | — |
| Expiry date | Feb 28, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2483/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The inventive method for forming a cured film on a substrate surface comprises coating the surface with a room temperature curable organosiloxazane polymer comprising, in a molecule, (a) at least one organosiloxane unit represented by the unit formula (a) at least one organosiloxane unit represented by the unit formula EQU R.sup.1.sub.a SiO.sub.(4-a)/2, and (b) at least one organosilazane unit represented by the unit formula EQU R.sup.2.sub.b Si(NR.sup.3).sub.(4-b)/2, in which R.sup.1, R.sup.2 and R.sup.3 are each a hydrogen atom or a substituted or unsubstituted monovalent hydrocarbon group, not all of them being simultaneously hydrogen atoms, and the subscripts a and b are each a positive integer of 1, 2 or 3 with the proviso that a and b cannot be simultaneously equal to 3, in a molecule and subjecting the coating film to exposure to a moisture-containing atmosphere. The method is useful for forming a surface-protecting film or for imparting surface releasability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.