Photoresist compositions containing quinone sensitizer
US4684599A · kind A · utility
15Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 1986 |
| Grant date | Aug 4, 1987 |
| Priority date | — |
| Expiry date | Jul 14, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/124
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Positive-working imaging compositions comprise a polymeric binder and a quinone sensitizer which provides alkali solubility to the composition when exposed to activating radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.