Polyacetal resin compositions having improved resistance to deterioration when exposed to light and containing alkylidene bis(benzotriazolyl phenols)
US4684679A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 1986 |
| Grant date | Aug 4, 1987 |
| Priority date | — |
| Expiry date | Jan 6, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08K5/3475
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polyacetal resin compositions are provided having improved light stability and comprising an alkylidene bis(benzotriazolyl phenol) having the formula: ##STR1## wherein: R.sub.1 is selected from the group consisting of hydrogen and alkyl having from one to about eleven carbon atoms; PA1 R.sub.2 is selected from the group consisting of alkyl having from one to about twelve carbon atoms; and arylalkyl having from seven to about eighteen carbon atoms; and PA1 X is selected from the group consisting of hydrogen; halogen; alkyl having from one to about twelve carbon atoms; aryl alkyl having from seven to about eighteen carbon atoms; alkoxy having from one to about twelve carbon atoms; phenoxy; arylalkoxy having from seven to about eighteen carbon atoms; and phenyl.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.