Method for preparing a thin-film electroluminescent display panel comprising a thin metal oxide layer and thick dielectric layer
US4686110A · kind A · utility
22Cited by
3References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 31, 1986 |
| Grant date | Aug 11, 1987 |
| Priority date | — |
| Expiry date | Jan 31, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B33/22
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A thin-film electroluminescent (EL) display panel comprises a thin-film EL layer, first and second dielectric layers, the thin-film EL layer being disposed between the dielectric layers, first and second metal oxide layers, and first and second electrodes, the first and second metal oxide layers being disposed respectively between the first and second dielectric layers, and the first and second electrodes. Preferably, at least one of the first and second metal oxide layers is made of Al.sub.2 O.sub.3, SiO.sub.2 or the like with a thickness of about 100-800.ANG. and at least one of the dielectric layers being about 1000-3000.ANG..
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.