Capacitance height gage applied in reticle position detection system for electron beam lithography apparatus
US4686531A · kind A · utility
21Cited by
2References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 29, 1985 |
| Grant date | Aug 11, 1987 |
| Priority date | — |
| Expiry date | Mar 29, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/304
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A capacitance height gage for positioning the reticle of an electron beam lithography apparatus. The gage includes a hybrid circuit substrate carrying four measuring and two reference capacitor circuits. Each has a driven plate, the four measuring plates disposed opposite the object surface to be measured, and the two reference plates disposed on the top of the substrate. Two ground plates are disposed a predetermine distance from the reference driven plates. The object surface comprises the ground plate for the four measuring driven plates. The reference plates calibrate the measuring plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.