Hybrid focused-flood ion beam system and method
US4687940A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 1986 |
| Grant date | Aug 18, 1987 |
| Priority date | — |
| Expiry date | Mar 20, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31755
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion beam microfabrication system is described which is capable of operating in either a flooded beam mode, in which a relatively high current beam is used to yield a rapid throughput, or in a low current, high resolution focused ion beam mode. With a focused beam a small, relatively low current ion spot is deflected in a predetermined pattern over a portion of the wafer to produce more detailed patterning that is not achievable in the flooded beam mode. A lens is added to the beam column to modify the beam collimation between the focused and flooded modes, and switching between modes is accomplished by simply actuating or de-actuating the lens. The beam is formed with a larger acceptance angle and total current in the flooded than the focused mode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.