Photosensitive film based on silicon-containing polymer and its use as a masking resin in a lithography process
US4689288A · kind A · utility
22Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 1985 |
| Grant date | Aug 25, 1987 |
| Priority date | — |
| Expiry date | Sep 19, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.