Electron impact ion source for trace analysis
US4689574A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1985 |
| Grant date | Aug 25, 1987 |
| Priority date | — |
| Expiry date | Nov 14, 2005 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N30/7206
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus is disclosed for analyzing trace elements in a gas sample. A unique feedback system is provided for accurately regulating and sensing the pressure supplied to the ion chamber of the device. The feedback system is capable of compensating for a wide range of input gas pressures. The apparatus also includes an improved closed ion source which is resistant to corrosion and aids in the reduction of noise. In addition, a method is disclosed to calibrate the detector for accurately scaling the measurements of trace elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.