High purity silicon nitride polishing compound
US4690693A · kind A · utility
8Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 1985 |
| Grant date | Sep 1, 1987 |
| Priority date | — |
| Expiry date | Dec 5, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/259
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A polishing compound is disclosed which is relatively high purity silicon nitride, the silicon nitride comprising particles having equiaxial crystals, the particle size being from about 0.03 to about 5 microns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.