Dual plasma microwave apparatus and method for treating a surface
US4691662A · kind A · utility
68Cited by
4References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 1986 |
| Grant date | Sep 8, 1987 |
| Priority date | — |
| Expiry date | Jun 12, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32678
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma apparatus which generates a radio frequency (UHF or microwave) disk plasma 16 and a hybrid plasma 45 derived from the disk plasma. The microwave plasma acts as a source of excited ion and free radical species and electrons for the second plasma which is hybrid in that it contains species from both microwave and dc (or rf depending on bias) excitation. The hybrid plasma can be used to treat an article 43 with different species than are present in the disk plasma and provides more control in this regard than a single plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.