Electron beam lithography apparatus
US4692579A · kind A · utility
16Cited by
4References
7Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | May 17, 1985 |
| Grant date | Sep 8, 1987 |
| Priority date | — |
| Expiry date | May 17, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31764
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An electron beam lithography apparatus comprises: a spot electron beam generator; device for exposing a desired pattern onto a wafer using the spot beam; device for dividing the pattern into small regions; and device for designating an origin of the small region and also digitally scanning the portion inside the small region by a fixed correction amount by use of the spot beam, and thereby to reduce the settling time of the D/A converter in association with the digital scanning.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.