Electrostatic chucks
US4692836A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 24, 1984 |
| Grant date | Sep 8, 1987 |
| Priority date | — |
| Expiry date | Oct 24, 2004 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T279/23
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In an electrostatic chuck of the type wherein an electrode is covered by an insulating dielectric member, an object, typically a semiconductor wafer, to be electrostatically attracted is mounted on the dielectric member, and a potential difference is applied across the wafer and the electrode, the electrode is shaped such that the distribution of the electrostatic attractive force applied to the wafer would not be uniform throughout the attractive surface of the chuck. To this end the electrode is constituted by a plurality of spaced rings or bars or provided with a plurality of circumferentially spaced radial members. When the wafer is flexed downwardly, the thickness of the dielectric member is varied continuously from one to the other end. Where the electrode is divided into a plurality of split electrodes, variable resistors are provided to apply the same or different DC voltages to the split electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.