X-ray dispersive and reflective structures and method of making the structures

US4693933A · kind A · utility

Assignee

• Ovonic Synthetic Materials Company, Inc. · US

Inventors

• John Keem · Bloomfield Hills, US
• Stanford R. Ovshinsky · Bloomfield Hills, US
• Steven A. Flessa · Southfield, US
• James L. Wood · Granby, US
• Keith L. Hart · Woodhaven, US
• Lennard Sztaba · Hamtramck, US

Key dates

• Filing date: Oct 31, 1983
• Grant date: Sep 15, 1987
• Expiry date: Oct 31, 2003

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/261
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

X-ray dispersive and reflective structures and materials are provided which exhibit improved resolution and reflectivity in specific ranges of interest without substantial fluorescence or absorption edges. The structures are formed of metallic and non-metallic layer pairs and can include a buffer layer between each layer to prevent interdiffusion to stabilize the structures. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.