Focused ion beam micromachining of optical surfaces in materials
US4698129A · kind A · utility
17Cited by
8References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 1, 1986 |
| Grant date | Oct 6, 1987 |
| Priority date | — |
| Expiry date | May 1, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/2633
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of forming one or more optical surfaces of the designer's choice in a body of material. The method includes the steps of exposing in a work zone a selected face in a body of selected material, directing a focused ion beam in a predetermined manner into the work zone to impinge the selected face, and by such directing and impinging, removing material from the body to create the desired optical surface(s). Preferably, beam direction is accomplished under the control of a suitably programmed computer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.