Deposition of titanium aluminides
US4698244A · kind A · utility
13Cited by
7References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 1985 |
| Grant date | Oct 6, 1987 |
| Priority date | — |
| Expiry date | Oct 31, 2005 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4488
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to an method of producing a titanium aluminide coating on a substrate by producing a flow of hydrogen and gaseous aluminum monochloride over a titanium surface to react to form a gaseous flow of titanium trichloride and aluminum monochloride and contacting the substrate with the flow of titanium trichloride and aluminum monochloride at a temperature of 800.degree. to 1200.degree. C., said substrate being a temperature below the temperature of the gases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.