Process for producing novel photosensitive resins
US4701497A · kind A · utility
4Cited by
14References
4Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 3, 1986 |
| Grant date | Oct 20, 1987 |
| Priority date | — |
| Expiry date | Jul 3, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F8/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I) ##STR1## (wherein n is at least 10) or an inorganic acid salt thereof with a compound having a cinnamic group in the presence of a solvent. The process is free from drawbacks as experienced in the production of a conventional photosensitive resin (e.g. polyvinyl cinnamate), such as formation of by-products during the polymerization of a monomer (e.g. vinyl cinnamate).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.