Device for electron emission including device for providing work function-reducing layer and method of applying such a layer
US4709185A · kind A · utility
4Cited by
3References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 1985 |
| Grant date | Nov 24, 1987 |
| Priority date | — |
| Expiry date | Jun 10, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2201/3423
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron-emitting surface is provided with a material reducing the electron work function, which is obtained from a suitable reaction. The reaction mixture or the product to be decomposed, for example CsN.sub.3, is present in a surface depression of a semiconductor body, while one or more pn junctions act as a heating diode. Upon heating, cesium is released and deposited on the electron-emitting surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.