Photosensitive recording materials

US4710446A · kind A · utility

Assignee

• BASF SE

Inventors

• Gerhard Hoffmann · Otterstadt, DE
• Reiner Hofmann · Neustadt, DE
• Albert Elzer · Otterstadt, DE

Key dates

• Filing date: Feb 14, 1985
• Grant date: Dec 1, 1987
• Expiry date: Feb 14, 2005

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/111
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A photosensitive recording material, in particular for the production of lithographic printing plates or resist images, possesses a photosensitive, photopolymerizable or electrophotographic recording layer which can be washed out with an aqueous, in particular aqueous alkaline, medium, the said recording layer containing, as a polymeric binder, a copolymer which is soluble or dispersible in the aqueous, in particular aqueous alkaline, medium and which contains, as a comonomer, an anhydride of a polymerizable, ethylenically unsaturated monocarboxylic acid in an amount of from 0.05 to 2% by weight, based on the copolymer, as copolymerized units.