Method for the glow-discharge-activated reactive deposition of electrically conductive material from a gaseous phase

US4713259A · kind A · utility

Assignee

• U.S. Philips Corporation · US

Inventors

• Georg Gartner · Aachen, DE
• Peter A. Janiel · Würselen, DE
• Hans Lydtin · Stolberg, DE

Key dates

• Filing date: Apr 28, 1986
• Grant date: Dec 15, 1987
• Expiry date: Apr 28, 2006

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/045
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

For the reactive deposition of tubular bodies of electrically conductive material from a flowing gas phase on a tubular substrate, a glow discharge 11 is produced between an inner electrode 6 and an outer electrode 2, one of which is constructed so as to be tubular and serves as a substrate. It is ensured that the electrodes 2, 6 are not short-circuited by growing conductive surface layers so that the glow discharge 11 extinguishes. Furthermore, the electrically conductive coating on the electrode 6 which does not function as the substrate electrode is interrupted in an insulating manner to locally limit the glow discharge 11. For example, by a gas barrier the deposit of an electrically conducting material on the insulation can be avoided. The glow discharge 11 is reciprocated during the deposition process.