Method and device for forming ultrafine particle film of compound
US4714047A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 1986 |
| Grant date | Dec 22, 1987 |
| Priority date | — |
| Expiry date | Apr 18, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0021
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for forming an ultrafine particle film of compound includes the steps of evacuating a vessel provided with an evaporation source in its bottom portion, by which a material to be evaporated is retained, and a base plate in its upper portion, on which ultrafine particles of compound are to be deposited, supplying a reactive gas into the evacuated vessel, evaporating the retained material by heating the evaporation source and making the material interact with the reactive gas to form ultrafine particles of compound and depositing the formed ultrafine particles of compound on the base plate. The reactive gas is directly supplied to an interaction area adjacent to the evaporation source, in which the evaporated material concentrically exists. And a device for forming a ultrafine particle film of compound has a vessel for forming a reactive gas atmosphere, an evaporation source for retaining and heating a material to be evaporated, which is provided in the bottom portion within the vessel, a base plate on which ultrafine particles of compound are to be deposited and which is provided in the upper portion within the vessel so as to be opposed to the evaporation source in the vert…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.