Apparatus for washing and drying substrates
US4714086A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 25, 1986 |
| Grant date | Dec 22, 1987 |
| Priority date | — |
| Expiry date | Sep 25, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for washing and drying a substrate and an apparatus therefor are disclosed which are capable of effectively rapidly carrying out the washing and drying of a semiconductor substrate in good yields without damaging and contaminating the substrate. The method comprises the steps of immersing a carrier carrying at least one substrate thereon into wash liquid; drawing up the carrier from the wash liquid while oscillating the substrate; and feeding drying gas to the substrate during the drawing-up of the carrier to remove the wash liquid from the surface of the substrate. The apparatus of the invention is constructed to allow the method to be effectively practiced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.