Chemical vapor deposition of aluminum on an activated surface

US4716050A · kind A · utility

Assignee

• American Telephone and Telegraph Company, AT&T Bell Laboratories · US

Inventors

• Martin L. Green · Summit, US
• Roland A. Levy · Berkeley Heights, US
• Ralph G. Nuzzo · Champaign, US

Key dates

• Filing date: Nov 10, 1986
• Grant date: Dec 29, 1987
• Expiry date: Nov 10, 2006

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/32051
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Chemical vapor deposition of an aluminum layer on a substrate is facilitated by surface activation prior to deposition. Surface activation is at relatively low temperature and results in a hydrated surface; low temperature surface activation is advantageous in the interest of keeping deposition apparatus free of additional chemicals, and substrates activated in this manner may be stored for considerable lengths of time prior to aluminum deposition. Among suitable activating agents are organochromium, organosilane, and organoaluminum compounds.