Method for removing water vapor from water vapor-containing gas
US4718921A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 1986 |
| Grant date | Jan 12, 1988 |
| Priority date | — |
| Expiry date | Oct 10, 2006 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2319/04
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A water vapor-containing gas is separated to a fraction thereof having an increased content of water vapor and a remaining fraction thereof having a decreased content of water vapor by a gas separating device which has at least one gas separating membrane having gas feed and delivery surfaces and a ratio P.sub.H.sbsb.2.sub.O /P.sub.CH.sbsb.4 of water vapor-permeating rate P.sub.H.sbsb.2.sub.O to methane gas permeating rate P.sub.CH.sbsb.4 of 200 or more, and preferably, made by an aromatic imide polymer, in such a manner that (1) a water vapor-containing feed gas is fed to a feed side of the gas separating device; (2) the feed gas is flowed along the gas feed surface of the gas separating membrane to allow a fraction of the feed gas to permeate through the gas separating membrane; (3) a drying gas containing 300 ppm or less of water vapor is fed to a delivery side of the gas separating device; (4) the fed drying gas is flowed along the delivery surface of the gas separating membrane to promote the permeation of water vapor through the gas separating membrane; (5) the permeated gas fraction is collected together with the flowed drying gas at the delivery side of the gas separating d…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.