Photosensitive material guide structure for developing apparatus
US4719484A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 6, 1986 |
| Grant date | Jan 12, 1988 |
| Priority date | — |
| Expiry date | Aug 6, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03D3/132
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive material guide structure for use in a developing apparatus adapted to develop a photosensitive material having been subjected to light exposure has at least one pair of feed rollers which feed forward the photosensitive material while clamping it therebetween within the developing apparatus. Both axial end portions of at least one of the pair of feed rollers are reduced in diameter. Accordingly, when the rollers clamp the photosensitive material to feed it, both the lateral edge portions of the photosensitive material are subjected to a clamping force which is weaker than that applied to the other portion of the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.