Light-sensitive silver halide photographic material
US4720452A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1986 |
| Grant date | Jan 19, 1988 |
| Priority date | — |
| Expiry date | Aug 7, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C2001/0357
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-sensitive silver halide photographic material having silver halide emulsion layers on a support, wherein at least one layer of said silver halide emulsion layers contains surface latent image type mono-dispersed silver halide grains, and 50% or more of the silver halide grains contained in said at least one silver halide emulsion layer are regular surface latent image type mono-dispersed silver halide grains of tetradecahedral crystals whose external surfaces have crystal faces with Miller indices (100) and (111), the area ratio of said (100) face and said (111) face satisfying the relation represented by the correlation formula (I) shown below: PA1 correlation formula (I): ##EQU1## wherein K is the ratio between the intensities of respective diffraction lines attributable to the (200) face and the (222) face measured in X-ray diffraction analysis as set forth in the following formula ##EQU2##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.