Method for neutralizing acidic novolak resin in a lithographic coating composition
US4721665A · kind A · utility
16Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1986 |
| Grant date | Jan 26, 1988 |
| Priority date | — |
| Expiry date | Sep 29, 2006 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/107
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention features a lithographic composition fabricated from a process wherein an acidic novolak resin is neutralized in solution. The solution comprises a common compatible solvent with the other ingredients of the coating composition, such as a positive sensitizer, a color changing dye, and a light activated, acid-releasing compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.