Process for producing fine patterns
US4722883A · kind A · utility
11Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 1986 |
| Grant date | Feb 2, 1988 |
| Priority date | — |
| Expiry date | Aug 7, 2006 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/008
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Fine patterns with high degree of resolution and high resistance to etching can be produced by coating a solution of a photosensitive composition comprising (a) an aromatic azide compound and (b) an alkaline-aqueous-solution-soluble polymer on a substrate, exposing predetermined portions of the coated photosensitive composition to ultraviolet light, developing with an alkaline aqueous solution to form a resist pattern, and etching the substrate using said resist pattern as a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.