Plasma CVD apparatus
US4723508A · kind A · utility
12Cited by
4References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 8, 1986 |
| Grant date | Feb 9, 1988 |
| Priority date | — |
| Expiry date | Apr 8, 2006 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3323
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma CVD apparatus including a reaction chamber; a pair of electrodes disposed in the reaction chamber between which plasma discharge occurs; a substrate support maintained at a reference voltage; a vacuum pump for evacuating the reaction chamber; a first voltage supply for supplying a first alternating voltage to one of the electrodes; and a second voltage supply for supplying a second alternating voltage to the other of the electrodes where the second alternating voltage is out-of-phase with respect to the first alternating voltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.