Single wafer centrifugal dryer
US4724619A · kind A · utility
19Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1986 |
| Grant date | Feb 16, 1988 |
| Priority date | — |
| Expiry date | Dec 10, 2006 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF26B5/08
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The device according to this invention comprises a casing in which turns a device designed to support and hold the wafer, the said device is fitted eccentrically with respect to its rotational pin (3) a support element 5-6 designed to hold the silicon wafer by its edges in a horizontal plane, the device assembly being mounted in stable balance with respect to the said pin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.