Vacuum manifold pumping system
US4725204A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 5, 1986 |
| Grant date | Feb 16, 1988 |
| Priority date | — |
| Expiry date | Nov 5, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vacuum pumping system comprises a plurality of vacuum processing vessels, semiconductor processing reactors, and the like, connected to a common manifold evacuated by a generously large central vacuum unit. The manifold is maintained at a substantially constant designated pre-set pressure higher than the pressures within the reactors by means of a gas bleed inlet valve controllably feeding an inert gas into the manifold. A blower package with valving, interposed between each reactor and the common manifold, discharges directly into the manifold and prevents pressure surges and excursions in the manifold and reactors as well as permitting each reactor to operate at different pressures independently of the existing manifold pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.