Apparatus for collection of particulate matter from an ambient gas
US4725294A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 13, 1987 |
| Grant date | Feb 16, 1988 |
| Priority date | — |
| Expiry date | Mar 13, 2007 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2001/2223
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for collecting particulate matter from a test atmosphere including a chamber having internal walls and posts which support an unpatterned ultra-clear wafer. A gas inlet tube penetrates the chamber with a central gas passageway for directing a stream of high velocity gas onto the wafer. Particles from the stream of gas are collected across most of the surface of the wafer by impaction and by deposition due to enhanced diffusion provided by a vacuum environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.