Etchant composition
US4725375A · kind A · utility
29Cited by
2References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 1986 |
| Grant date | Feb 16, 1988 |
| Priority date | — |
| Expiry date | Sep 16, 2006 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F1/26
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An etchant composition comprising PA0 (a) a cerium (IV) salt, PA0 (b) a nonionic or anionic fluorine-containing surfactant, PA0 (c) water, and PA0 (d) optionally, at least one compound selected from the group consisting of perchloric acid, acetic acid, sulfuric acid, nitric acid and hydrochloric acid and salts thereof, which can homogeneously etch a resist pattern having thin gaps as well as wide gaps on a chrome layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.